Sputtering equipment and co entrepreneurship

The JS-1600 small ion sputtering instrument is designed based on the principle of bipolar (DC) direct current sputtering, with simple and convenient operation. It is suitable for sample preparation in scanning electron microscopy (SEM) and the production of experimental electrodes for non-conductive materials.

Users can choose different vacuum conditions and sputtering currents according to their own needs. The large-sized vacuum chamber design meets the sputtering requirements of large samples. A standard gold target with a purity of 99.999% provides a good foundation for obtaining high-quality gold film.

JS-1600Small ion sputtering instrumentThe main technical indicators are as follows:

1. Target (upper electrode): Material: gold, diameter: 50mm, thickness: 0.1mm, purity: 99.999%

2. Vacuum chamber: diameter: 160mm, height: 120mm

3. Sample stage (lower electrode): Sputtering area: Diameter: 50mm

4. Working vacuum：8×10^-2—2×10^-1mbar

5. Ionic ammeter:50mA

6. Digital timer: Set the single sputtering time according to sputtering habits.

7.Voltage: -1600DVC

8. Mechanical pump: 2 liters per second

9. Studio working medium gas: air or argon gas,

10．Miniature vacuum valve: Equipped with dedicated argon gas inlet and micro inflation adjustment，Can connect to a 3mm hose.

11. External dimensions:360mm×300mm×380mm

Remarks: JS-600Small ion sputtering instrumentApplicable target materials: gold, platinum, silver, and zinc oxide