Domestic magnetron sputtering equipment manufacturer

1、 Product application:

JS-600MSmall magnetron sputtering instrumentDesigned based on the principle of bipolar (DC) direct current sputtering, with a magnetron target and water cooling function. The device is easy to operate and suitable for sample preparation in scanning electron microscopy (SEM) and electrode fabrication in non-conductive material experiments.

Magnetron sputtering is cold sputtering, which has a lower temperature rise on the surface of the sample and is suitable for thin film samples that are more sensitive to temperature. Users can choose different vacuum conditions and sputtering currents according to their own needs. The large-sized vacuum chamber design meets the sputtering requirements of large samples. Comes standard with a gold target with a purity of 99.999%, providing a solid foundation for obtaining high-quality gold films.

2、 Configuration and technical specifications:

1. This system is equipped with a water-cooled magnetic control target with a target surface diameter of 50mm;

2. Host specifications: L360mm * W300mm * H380mm;

3. Target (upper electrode): Gold: Diameter: 50mm, Thickness: 0.1mm;

4. Vacuum sample chamber: diameter: 160mm, height: 110mm;

5. Sputtering area: Ø 50mm;

6. Working vacuum: 2 × 10-1-6 × 10-2 mbar;

7. Ionic ammeter: 0-100mA;

8. Timer: Set the single sputtering time according to sputtering habits;

9. Needle valve: equipped with an air inlet, micro inflation adjustment, and can be connected to a φ 4 * 2.5mm hose;

10. Working medium gases in the studio: various gases such as air or argon;

11. Sputtering voltage: -1600 DCV;

12. Leap vacuum pump (VRD-4): 1.1L/s.

3、 Product features:

1. Lightweight and with a large sputtering area;

2. Platinum, gold, silver, and zinc oxide can be sputtered;

3. High sputtering efficiency, can be cooled by water cooling;

Remarks: JS-600MSmall magnetron sputtering instrumentApplicable target materials: gold, platinum, silver.