Online vacuum plasma cleaning machine wiring

NegotiableUpdate on 02/22

Model

Nature of the Manufacturer: Producers

Product Category

Place of Origin

Online Consult

Overview

VPS-RF120 vacuum plasma cleaning equipment is a small desktop plasma cleaning machine specially developed for laboratory needs. The processing chamber is made of cylindrical quartz glass, and the processor is a capacitive coupled external electrode type with no electrodes inside.

Product Details

VPS-RF120 Vacuum Plasma Cleaning EquipmentIntroduction:

The VPS-RF120 vacuum plasma cleaning equipment mainly consists of a vacuum chamber, a high-frequency plasma power supply, a vacuum generation and measurement system, a process gas system, and a control system. The basic working principle is to use a vacuum pump to evacuate the working chamber to a certain degree of vacuum, and then introduce process gas. Under the action of a high-frequency generator, a high-frequency alternating electric field is formed between the anode and cathode, ionizing the gas and forming plasma. When a gas reaches a plasma state, gaseous molecules will split into many highly active particles. The mechanism of plasma cleaning relies on the "activation effect" of substances in the "plasma state" to remove surface stains or improve surface activity of objects.

VPS-RF120 真空等离子清洗设备

VPS-RF120 Vacuum Plasma Cleaning EquipmentFeatures:European and American discharge technology, professional discharge structure, scientifically simulated uniform plasma distribution, and uniform treatment effect

Product application: Remove surface organic matter, clean surface oil stains, improve surface hydrophilicity, enhance surface adhesion, improve surface adhesion, and enhance binding performance

Product Parameters:

model	VPS-RF120
Plasma frequency	13.56MHz automatic impedance matching
工作真空度	10-100Pa
vacuum pump	Oil pump/dry pump (optional)
power	0-1000W adjustable
Material of the cavity	Imported grade 316L stainless steel/aviation aluminum alloy (optional)
Cavity Size	500(W)500(D)490(H)mm
Chamber volume	120L
Single layer effective processing area	450mm（W）*430mm(D)
Number of gas paths	2-channel gas, supporting oxygen, argon, nitrogen, hydrogen, etc. (corrosive gases need to be customized)
Processing layers	8th floor (customizable)
Control method	PLC+touch screen
power supply	AC380V,50/60Hz
Overall dimensions	950mm(L)×1100mm(W) ×1800 mm(H)